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Liquid crystal light valve structuresAn improved photosensor film and liquid crystal light valves embodying said film is provided. The photosensor film and liquid crystal light valve is characterized by a significant lower image retention time while maintaining acceptable photosensitivity. The photosensor film is produced by sputter depositing CdS onto an ITO substrate in an atmosphere of argon/H2S gas while maintaining the substrate at a temperature in the range of about 130 C to about 200 C and while introducing nitrogen gas into the system to the extent of not more than about 1% of plasma mixture. Following sputter deposition of the CdS, the film is annealed in an inert gas at temperatures ranging from about 300 C to about 425 C.
Document ID
19850025513
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Koda, N. J.
(Hughes Aircraft Co. Los Angeles, Calif., United States)
Date Acquired
August 12, 2013
Publication Date
June 11, 1985
Subject Category
Solid-State Physics
Report/Patent Number
Patent Number: US-PATENT-4,522,469
Patent Number: NASA-CASE-MSC-20036-1
Patent Application Number: US-PATENT-APPL-SN-569372
Accession Number
85N33826
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-4,522,469|NASA-CASE-MSC-20036-1
Patent Application
US-PATENT-APPL-SN-569372
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