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Compact Plasma Deposition ChamberContamination and nonuniformity are reduced. Substrates serve as walls of deposition chamber in configuration for plasma deposition of amorphous silicon. New chamber intended for production of amorphous silicon solar cells. Design reduces requirements on chamber size and expected to increase product quality.
Document ID
19860000081
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Bickler, D. B.
(Caltech)
Date Acquired
August 12, 2013
Publication Date
June 1, 1986
Publication Information
Publication: NASA Tech Briefs
Volume: 10
Issue: 1
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-16469
Report Number: NPO-16469
ISSN: 0145-319X
Accession Number
86B10081
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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