NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Collections About News Help Login
Back to Results
Apparatus for edge etching of semiconductor wafersA device for use in the production of semiconductors, characterized by etching in a rapidly rotating etching bath is described. The fast rotation causes the surface of the etching bath to assume the form of a paraboloid of revolution, so that the semiconductor wafer adjusted at a given height above the resting bath surface is only attacked by etchant at the edges.
Document ID
19860012249
Acquisition Source
Legacy CDMS
Document Type
Other - Other
Authors
Casajus, A. (NASA Headquarters Washington, DC United States)
Date Acquired
September 5, 2013
Publication Date
February 1, 1986
Subject Category
Engineering (General)
Report/Patent Number
NAS 1.15:77998
NASA-TM-77998
Report Number: NAS 1.15:77998
Report Number: NASA-TM-77998
Accession Number
86N21720
Funding Number(s)
CONTRACT_GRANT: NASW-4005
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

Related Records

There are no records associated with this record.
No Preview Available