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Fast-Response Heating of Silicon MeltsProposed improvement for silicon crystal growing enables rapid heating of melt in vicinity of liquid-solid interface to compensate for decreases in melt temperature, to ensure uniform diameter and composition in ingot. Intended for growing large silicon ingots by Czochralski process, cylindrical single-crystal ingot pulled from molten silicon. Heating confined to small mass near growing crystal.
Document ID
19870000045
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Morrison, A. D.
(Caltech)
Date Acquired
August 13, 2013
Publication Date
January 1, 1987
Publication Information
Publication: NASA Tech Briefs
Volume: 11
Issue: 1
ISSN: 0145-319X
Subject Category
Fabrication Technology
Report/Patent Number
NPO-16730
ISSN: 0145-319X
Report Number: NPO-16730
Accession Number
87B10045
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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