A simple method for monitoring surface temperatures in plasma treatments

A method consisting of applying temperature markers on the specimen is described for measuring the highest temperature reached by very thin films in situ during deposition. In the first test setup, lowering the input power to 500 W only effected the 177-C marker, while increasing the input power to 1.25 kW effected the 274-C marker. In tests conducted in a dc plasma with markers placed on the uncooled cathode in Ar plasma, the maximum temperatures indicated by the thermocouple matched a change in color of the markers, and no effect of earlier sublimation or decomposition was noted.