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Advanced development of double-injection, deep-impurity semiconductor switchesDeep-impurity, double-injection devices, commonly refered to as (DI) squared devices, represent a class of semiconductor switches possessing a very high degree of tolerance to electron and neutron irradiation and to elevated temperature operation. These properties have caused them to be considered as attractive candidates for space power applications. The design, fabrication, and testing of several varieties of (DI) squared devices intended for power switching are described. All of these designs were based upon gold-doped silicon material. Test results, along with results of computer simulations of device operation, other calculations based upon the assumed mode of operation of (DI) squared devices, and empirical information regarding power semiconductor device operation and limitations, have led to the conculsion that these devices are not well suited to high-power applications. When operated in power circuitry configurations, they exhibit high-power losses in both the off-state and on-state modes. These losses are caused by phenomena inherent to the physics and material of the devices and cannot be much reduced by device design optimizations. The (DI) squared technology may, however, find application in low-power functions such as sensing, logic, and memory, when tolerance to radiation and temperature are desirable (especially is device performance is improved by incorporation of deep-level impurities other than gold.
Document ID
19880015962
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Hanes, M. H.
(Westinghouse Research and Development Center Pittsburgh, PA, United States)
Date Acquired
September 5, 2013
Publication Date
December 7, 1987
Subject Category
Solid-State Physics
Report/Patent Number
NAS 1.26:182118
NASA-CR-182118
Report Number: NAS 1.26:182118
Report Number: NASA-CR-182118
Accession Number
88N25346
Funding Number(s)
CONTRACT_GRANT: NAS3-24637
PROJECT: RTOP 506-41-41
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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