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Strength of hot isostatically pressed and sintered reaction bonded silicon nitrides containing Y2O3The hot isostatic pressing of reaction bonded Si3N4 containing Y2O3 produced specimens with greater room temperature strengths than those by high pressure nitrogen sintering of the same material. Average room temperature bend strengths for hot isostatically pressed reaction bonded silicon nitride and high pressure nitrogen sintered reaction bonded silicon nitride were 767 and 670 MPa, respectively. Values of 472 and 495 MPa were observed at 1370 C. For specimens of similar but lower Y2O3 content produced from Si3N4 powder using the same high pressure nitrogen sintering conditions, the room temperature strength was 664 MPa and the 1370 C strength was 402 MPa. The greater strengths of the reaction bonded silicon nitride materials in comparison to the sintered silicon nitride powder material are attributed to the combined effect of processing method and higher Y2O3 content.
Document ID
19890005886
Acquisition Source
Glenn Research Center
Document Type
Technical Memorandum (TM)
Authors
William A Sanders
(Glenn Research Center Cleveland, Ohio, United States)
Diane M Mieskowski
(Glenn Research Center Cleveland, Ohio, United States)
Date Acquired
September 5, 2013
Publication Date
January 1, 1989
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA-TM-101443
NAS 1.15:101443
E-4429
Report Number: NASA-TM-101443
Report Number: NAS 1.15:101443
Report Number: E-4429
Accession Number
89N15257
Funding Number(s)
PROJECT: RTOP 505-63-01
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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