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Working group written presentation: Atomic oxygenEarlier Shuttle flight experiments have shown NASA and SDIO spacecraft designed for operation in low-Earth orbit (LEO) must take into consideration the highly oxidative characteristics of the ambient flight environment. Materials most adversely affected by atomic oxygen interactions include organic films, advanced (carbon-based) composites, thermal control coatings, organic-based paints, optical coatings, and thermal control blankets commonly used in spacecraft applications. Earlier results of NASA flight experiments have shown prolonged exposure of sensitive spacecraft materials to the LEO environment will result in degraded systems performance or, more importantly, lead to requirements for excessive on-orbit maintenance, with both conditions contributing significantly to increased mission costs and reduced mission objectives. Flight data obtained from previous Space Shuttle missions and results of the Solar Max recovery mission are limited in terms of atomic oxygen exposure and accuracy of fluence estimates. The results of laboratory studies to investigate the long-term (15 to 30 yrs) effects of AO exposure on spacecraft surfaces are only recently available, and qualitative correlations of laboratory results with flight results have been obtained for only a limited number of materials. The working group recommended the most promising ground-based laboratories now under development be made operational as soon as possible to study the full-life effects of atomic oxygen exposure on spacecraft systems.
Document ID
19890014193
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Leger, Lubert J.
(NASA Lyndon B. Johnson Space Center Houston, TX, United States)
Visentine, James T.
(NASA Lyndon B. Johnson Space Center Houston, TX, United States)
Date Acquired
September 5, 2013
Publication Date
May 1, 1989
Publication Information
Publication: NASA, Langley Research Center, NASA(SDIO Space Environmental Effects on Materials Workshop, Part 2
Subject Category
Chemistry And Materials (General)
Accession Number
89N23564
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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