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Undercutting of defects in thin film protective coatings on polymer surfaces exposed to atomic oxygenProtection for polymeric surfaces is needed to make them durable in the low Earth orbital environment, where oxidation by atomic oxygen is the predominant failure mechanism. Thin film coatings of oxides such as silicon dioxide are viable candidates to provide this protection, but concern has been voiced over the ability of these coatings to protect when defects are present in the coating due to surface anomalies occurring during the deposition process, handling, or micrometeoroid and debris bombardment in low Earth orbit. When a defected coating protecting a polymer substrate is exposed to atomic oxygen, the defect provides a pathway to the underlying polymer allowing oxidation and subsequent undercutting to occur. Defect undercutting was studied for sputter deposited coatings of silicon dioxide on polyimide Kapton. Preliminary results indicate that undercutting may be limited as long as the coating remains intact with the substrate. Therefore, coatings may not need to be defect free to give protection to the underlying surface.
Document ID
19890014320
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Rutledge, Sharon K.
(NASA Lewis Research Center Cleveland, OH, United States)
Mihelcic, Judith A.
(Cleveland State Univ. OH., United States)
Date Acquired
September 5, 2013
Publication Date
January 1, 1989
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA-TM-101986
NAS 1.15:101986
E-4686
Meeting Information
Meeting: International Conference on Metallurgical Coatings
Location: San Diego, CA
Country: United States
Start Date: April 17, 1989
End Date: April 21, 1989
Sponsors: American VAcuum Society
Accession Number
89N23691
Funding Number(s)
PROJECT: RTOP 474-46-10
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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