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Rapid fabrication of lightweight ceramic mirrors via chemical vapor depositionLightweight Si/SiC mirrors of nominal diameter 7.5 cm have been fabricated via a scalable and rapid CVD process to demonstrate the CVD mirror fabrication technology. These mirrors consist of a faceplate of either Si or Si-coated SiC and a lightweight backstructure made of either Si or SiC. The mirrors were polished to a figure better than 1/5th of a wave at 0.6328 A and a finish of better than 10 A rms. A procedure for fabricating these mirrors is described. The CVD fabrication process is fast and has the potential to yield several mirrors in a few weeks time from a single reactor. The CVD mirror fabrication technology is quite general and can be extended to include mirrors of other ceramic materials such as TiB2 and B4C.
Document ID
19890056596
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Goela, Jitendra S.
(CVD, Inc. Woburn, MA, United States)
Taylor, Raymond L.
(Morton Thiokol, Inc.; CVD, Inc., Woburn, MA, United States)
Date Acquired
August 14, 2013
Publication Date
June 19, 1989
Publication Information
Publication: Applied Physics Letters
Volume: 54
ISSN: 0003-6951
Subject Category
Mechanical Engineering
Accession Number
89A43967
Funding Number(s)
CONTRACT_GRANT: NAS1-18476
Distribution Limits
Public
Copyright
Other

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