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Five-Segment Interconnection For Electromigration TestsProposed integrated-circuit conductive pattern intended for use in electromigration lifetime testing of interconnection lines of integrated circuits. Designed for collection of statistics on electromigration from smallest possible area. Includes 5 interconnection segments with Kelvin voltage taps, with total of 12 contact pads, and provides for simultaneous measurements on all of segments. Attempts to minimize thermal gradients within each segment and conforms to guidelines on electromigration test structures promulgated by National Institute of Standards and Technology (NIST).
Document ID
19910000358
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Hannaman, David J.
(Caltech)
Buehler, Martin G.
(Caltech)
Date Acquired
August 14, 2013
Publication Date
August 1, 1991
Publication Information
Publication: NASA Tech Briefs
Volume: 15
Issue: 8
ISSN: 0145-319X
Subject Category
Electronic Components And Circuits
Report/Patent Number
NPO-18105
ISSN: 0145-319X
Report Number: NPO-18105
Accession Number
91B10358
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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