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Single-Exposure Long-Equivalent-Wavelength InterferometryProposed single-exposure technique for producing long-equivalent-wavelength interferograms (LEWI's) involves use of photographic film to record two-wavelength interferogram nonlinearly in single exposure. Nonlinearity required to produce difference-spatial-frequency Fourier component containing LEWI information obtained by adjusting exposure so it falls on nonlinear portion of sensitivity curve of film. After two-wavelength interferogram recorded, film developed in conventional manner. Possible to use LEWI's to measure surface contours of such objects as human corneas, not expected to remain stationary for two exposures. Commercial interferogram-processing computer programs used to convert LEWI's into topographical representations of surfaces.
Document ID
19910000582
Acquisition Source
Legacy CDMS
Document Type
Other - NASA Tech Brief
Authors
Hochberg, Eric B.
(Caltech)
Date Acquired
August 14, 2013
Publication Date
November 1, 1991
Publication Information
Publication: NASA Tech Briefs
Volume: 15
Issue: 11
ISSN: 0145-319X
Subject Category
Physical Sciences
Report/Patent Number
NPO-17580
Report Number: NPO-17580
ISSN: 0145-319X
Accession Number
91B10582
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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