Physical optics for oven-plate scattering prediction

An oven assembly design is described, which will be used to determine the effects of temperature on the electrical properties of materials which are used as coatings for metal plates. Experimentally, these plates will be heated to a very high temperature in the oven assembly, and measured using a microwave reflectance measurement system developed for the NASA Lewis Research Center, Near-Field Facility. One unknown in this measurement is the effect that the oven assembly will have on the reflectance properties of the plate. Since the oven will be much larger than the plate, the effect could potentially be significant as the size of the plate becomes smaller. Therefore, it is necessary to predict the effect of the oven on the measurement of the plate. A method for predicting the oven effect is described, and the theoretical oven effect is compared to experimental results of the oven material. The computer code which is used to predict the oven effect is also described.