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Sputtering of ions from Cu and Al by low energy oxygen ion bombardmentThe sputtering of Cu(+) and Al(+) ions from copper and aluminum while the target surface is bombarded with low energy oxygen ions (20 to 500 eV), is investigated. Both the ion yield, as a function of oxygen ion energy, and the kinetic energy distribution of the sputtered ions at a given oxygen ion energy are determined.
Document ID
19920013128
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Eck, T. G. (Case Western Reserve Univ. Cleveland, OH, United States)
Chen, L.-Y. (Case Western Reserve Univ. Cleveland, OH, United States)
Hoffman, R. W. (Case Western Reserve Univ. Cleveland, OH, United States)
Date Acquired
September 6, 2013
Publication Date
February 1, 1992
Publication Information
Publication: NASA. Johnson Space Center, 5th Annual Workshop on Space Operations Applications and Research (SOAR 1991), Volume 2
Subject Category
Metallic Materials
Accession Number
92N22371
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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IDRelationTitle19920013081Collected WorksFifth Annual Workshop on Space Operations Applications and Research (SOAR 1991), volume 2
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