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Metal etching compositionThe present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent. The etching composition is particularly useful for etching metal surfaces in preparation for subsequent fluorescent penetrant inspection.
Document ID
19920016156
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Otousa, Joseph E. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Thomas, Clark S. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Foster, Robert E. (NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
August 15, 2013
Publication Date
July 23, 1991
Subject Category
Inorganic And Physical Chemistry
Report/Patent Number
Patent Number: NASA-CASE-MFS-29576-1
Patent Application Number: US-PATENT-APPL-SN-587890
Patent Number: US-PATENT-5,034,093
Accession Number
92N25399
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-MFS-29576-1|US-PATENT-5,034,093
Patent Application
US-PATENT-APPL-SN-587890

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