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Gibbs free energy of reactions involving SiC, Si3N4, H2, and H2O as a function of temperature and pressureSilicon carbide and silicon nitride are considered for application as structural materials and coating in advanced propulsion systems including nuclear thermal. Three-dimensional Gibbs free energy were constructed for reactions involving these materials in H2 and H2/H2O. Free energy plots are functions of temperature and pressure. Calculations used the definition of Gibbs free energy where the spontaneity of reactions is calculated as a function of temperature and pressure. Silicon carbide decomposes to Si and CH4 in pure H2 and forms a SiO2 scale in a wet atmosphere. Silicon nitride remains stable under all conditions. There was no apparent difference in reaction thermodynamics between ideal and Van der Waals treatment of gaseous species.
Document ID
19920022034
Acquisition Source
Legacy CDMS
Document Type
Technical Publication (TP)
Authors
Isham, M. A.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
September 6, 2013
Publication Date
August 1, 1992
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA-TP-3275
M-694
NAS 1.60:3275
Report Number: NASA-TP-3275
Report Number: M-694
Report Number: NAS 1.60:3275
Accession Number
92N31278
Funding Number(s)
PROJECT: RTOP 593-71-51
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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