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Reactions of silicon carbide and silicon(IV) oxide at elevated temperaturesThe reaction between SiC and SiO2 has been studied in the temperature range 1400-1600 K. A Knudsen cell in conjunction with a vacuum microbalance and a high-temperature mass spectrometer was used for this study. Two systems were studied - 1:1 SiC (2 wt pct excess carbon) and SiO2; and 1:1:1 SiC, carbon, and SiO2. In both cases the excess carbon forms additional SiC within the Knudsen cell and adjusts to the direct reaction of stoichiometric SiC and SiO2 to form SiO(g) and CO(g) in approximately a 3:1 ratio. These results are interpreted in terms of the Si-C-O stability diagram.
Document ID
19920060859
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Jacobson, Nathan S.
(NASA Lewis Research Center Cleveland, OH, United States)
Lee, Kang N.
(NASA Lewis Research Center Cleveland, OH, United States)
Fox, Dennis S.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
August 15, 2013
Publication Date
June 1, 1992
Publication Information
Publication: American Ceramic Society, Journal
Volume: 75
Issue: 6, Ju
ISSN: 0002-7820
Subject Category
Nonmetallic Materials
Accession Number
92A43483
Distribution Limits
Public
Copyright
Other

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