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Rapid Thermal Processing (RTP) of semiconductors in spaceThe progress achieved on the project entitled 'Rapid Thermal Processing of Semiconductors in Space' for a 12 month period of activity ending March 31, 1993 is summarized. The activity of this group is being performed under the direct auspices of the ROMPS program. The main objective of this program is to develop and demonstrate the use of advanced robotics in space with rapid thermal process (RTP) of semiconductors providing the test technology. Rapid thermal processing is an ideal processing step for demonstration purposes since it encompasses many of the characteristics of other processes used in solid state device manufacturing. Furthermore, a low thermal budget is becoming more important in existing manufacturing practice, while a low thermal budget is critical to successful processing in space. A secondary objective of this project is to determine the influence of microgravity on the rapid thermal process for a variety of operating modes. In many instances, this involves one or more fluid phases. The advancement of microgravity processing science is an important ancillary objective.
Document ID
19930019219
Acquisition Source
Legacy CDMS
Document Type
Contractor Report (CR)
Authors
Anderson, T. J.
(Florida Univ. Gainesville, FL, United States)
Jones, K. S.
(Florida Univ. Gainesville, FL, United States)
Date Acquired
September 6, 2013
Publication Date
January 1, 1993
Subject Category
Materials Processing
Report/Patent Number
NASA-CR-193110
NAS 1.26:193110
Report Number: NASA-CR-193110
Report Number: NAS 1.26:193110
Accession Number
93N28408
Funding Number(s)
CONTRACT_GRANT: NAG5-1809
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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