Multilayer thin film design as far ultraviolet polarizersWe use a concept of induced transmission and absorption to design multilayer thin film reflection polarizers in the FUV region. We achieve high s-polarization reflectance and a high degree of polarization by means of a MgF2/Al/MgF2 three layer structure on an opaque thick film of aluminum as the substrate. For convenience they are designed at a 45 deg angle of incidence. For example, our polarizer designed for the Lyman-alpha line (121.6 nm) has 88.67 percent reflectance for the s-polarization case, and 1.21 percent for the p-polarization case, with a degree of polarization of 97.31 percent. If we make a double surface polarizer with this design, it will have a degree of polarization of 99.96 percent and s-polarization throughput of 78.62 percent.
Document ID
19930055643
Acquisition Source
Legacy CDMS
Document Type
Conference Paper
Authors
Kim, Jongmin (NASA Marshall Space Flight Center Huntsville, AL, United States)
Zukic, Muamer (NASA Marshall Space Flight Center Huntsville, AL, United States)
Torr, Douglas T. (Alabama Univ. Huntsville, United States)
Date Acquired
August 16, 2013
Publication Date
January 1, 1993
Publication Information
Publication: In: Multilayer and grazing incidence X-ray(EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992 (A93-39601 15-74)
Publisher: Society of Photo-Optical Instrumentation Engineers
IDRelationTitle19930055604Collected WorksMultilayer and grazing incidence X-ray/EUV optics for astronomy and projection lithography; Proceedings of the Meeting, San Diego, CA, July 19-22, 1992