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Characteristics of III-V Semiconductor Devices at High TemperatureThis paper presents the development of III-V based pseudomorphic high electron mobility transistors (PHEMT's) designed to operate over the temperature range 77 to 473 K (-196 to 200 C). These devices have a pseudomorphic undoped InGaAs channel that is sandwiched between an AlGaAs spacer and a buffer layer; gate widths of 200, 400, 1600, and 3200 micrometers; and a gate length of 2 micrometers. Measurements were performed at both room temperature and 473 K (200 C) and show that the drain current decreases by 30 percent and the gate current increases to about 9 microns A (at a reverse bias of -1.5 V) at the higher temperature. These devices have a maximum DC power dissipation of about 4.5 W and a breakdown voltage of about 16 V.
Document ID
19940028546
Acquisition Source
Headquarters
Document Type
Conference Paper
Authors
Simons, Rainee N.
(NYMA, Inc. Brook Park, OH., United States)
Young, Paul G.
(Toledo Univ. OH., United States)
Taub, Susan R.
(NASA Lewis Research Center Cleveland, OH, United States)
Alterovitz, Samuel A.
(NASA Lewis Research Center Cleveland, OH, United States)
Date Acquired
September 6, 2013
Publication Date
June 1, 1994
Subject Category
Electronics And Electrical Engineering
Report/Patent Number
NAS 1.15:106574
NASA-TM-106574
E-8801
Report Number: NAS 1.15:106574
Report Number: NASA-TM-106574
Report Number: E-8801
Meeting Information
Meeting: International High Temperature Electronics Conference
Location: Charlotte, NC
Country: United States
Start Date: June 5, 1994
End Date: June 10, 1994
Sponsors: Sandia National, Phillips and Wright Laboratories
Accession Number
94N33052
Funding Number(s)
PROJECT: RTOP 506-44-2C
CONTRACT_GRANT: NAS3-25266
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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