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Ampoule failure sensor time response testing: Experiments 2 and 3The response time of an ampoule failure sensor exposed to a liquid or vapor gallium-arsenide (GaAs) and the corresponding breach time of the containing cartridge is investigated. The experiments were conducted in niobium-hafnium (WC-103) cartridges with an exterior silicide coating. These cartridges were built to flight specifications that were used in NASA's Crystal Growth Furnace during the first United States Microgravity Laboratory (USML-1) mission. The ampoule failure sensor is a chemical fuse made from a metal with which the semiconductor material reacts more rapidly than it does with the containing cartridge. In these experiments a platinum metal was used for the manufacture of the sensors. This technical report discusses the response time of two different sensor designs. The first design utilizes a helical wrapped wire and the second uses a single bare wire element. Experimental results indicate that both sensors are adequate in sensing the presence of molten or vapor GaAs with the latter having a 2-minute longer response time. In both experiments, the containing cartridge was breached within 185 minutes after ampoule rupture.
Document ID
19940032315
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Johnson, M. L.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Watring, D. A.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
September 6, 2013
Publication Date
June 1, 1994
Subject Category
Instrumentation And Photography
Report/Patent Number
NASA-TM-108458
NAS 1.15:108458
Report Number: NASA-TM-108458
Report Number: NAS 1.15:108458
Accession Number
94N36822
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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