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Diamines and polyimides containing pendent ethynyl groupsDiamines containing pendent ethynyl and substituted ethynyl groups are synthesized. These diamines are reacted with dianhydrides to form polyamide acids, which are chemically or thermally cyclodehydrated to form polyimides and copolyimides with pendent ethynyl groups. Upon heating, the pendent ethynyl groups react to form crosslinked resins that are useful as adhesives, composite matrices, coatings, moldings, and films.
Document ID
19950008002
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Hergenrother, Paul M. (NASA Langley Research Center Hampton, VA, United States)
Jensen, Brian J. (NASA Langley Research Center Hampton, VA, United States)
Date Acquired
August 17, 2013
Publication Date
September 6, 1994
Subject Category
Nonmetallic Materials
Report/Patent Number
Patent Application Number: US-PATENT-APPL-SN-045345
Patent Number: NASA-CASE-LAR-14825-1
Patent Number: US-PATENT-5,344,982
Accession Number
95N14416
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-LAR-14825-1|US-PATENT-5,344,982
Patent Application
US-PATENT-APPL-SN-045345

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