Material processing of convection-driven flow field and temperature distribution under oblique gravity

A set of mathematical formulation is adopted to study vapor deposition from source materials driven by heat transfer process under normal and oblique directions of gravitational acceleration with extremely low pressure environment of 10(exp -2) mm Hg. A series of time animation of the initiation and development of flow and temperature profiles during the course of vapor deposition has been obtained through the numerical computation. Computations show that the process of vapor deposition has been accomplished by the transfer of vapor through a fairly complicated flow pattern of recirculation under normal direction gravitational acceleration. It is obvious that there is no way to produce a homogeneous thin crystalline films with fine grains under such a complicated flow pattern of recirculation with a non-uniform temperature distribution under normal direction gravitational acceleration. There is no vapor deposition due to a stably stratified medium without convection for reverse normal direction gravitational acceleration. Vapor deposition under oblique direction gravitational acceleration introduces a reduced gravitational acceleration in vertical direction which is favorable to produce a homogeneous thin crystalline films. However, oblique direction gravitational acceleration also induces an unfavorable gravitational acceleration along horizontal direction which is responsible to initiate a complicated flow pattern of recirculation. In other words, it is necessary to carry out vapor deposition under a reduced gravity in the future space shuttle experiments with extremely low pressure environment to process vapor deposition with a homogeneous crystalline films with fine grains. Fluid mechanics simulation can be used as a tool to suggest most optimistic way of experiment with best setup to achieve the goal of processing best nonlinear optical materials.