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Evaluation of HCFC AK 225 Alternatives for Precision Cleaning and VerificationMaintaining qualified cleaning and verification processes are essential in an production environment. Environmental regulations have and are continuing to impact cleaning and verification processing in component and large structures, both at the Michoud Assembly Facility and component suppliers. The goal of the effort was to assure that the cleaning and verification proceeds unimpeded and that qualified, environmentally compliant material and process replacements are implemented and perform to specifications. The approach consisted of (1) selection of a Supersonic Gas-Liquid Cleaning System; (2) selection and evaluation of three cleaning and verification solvents as candidate alternatives to HCFC 225 (Vertrel 423 (HCFC), Vertrel MCA (HFC/1,2-Dichloroethylene), and HFE 7100DE (HFE/1,2 Dichloroethylene)); and evaluation of an analytical instrumental post cleaning verification technique. This document is presented in viewgraph format.
Document ID
19990013644
Acquisition Source
Marshall Space Flight Center
Document Type
Contractor Report (CR)
Authors
Melton, D. M.
(Lockheed Martin Corp. Huntsville, AL United States)
Date Acquired
September 6, 2013
Publication Date
January 1, 1998
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA/CR-1998-208099
NAS 1.26:208099
Report Number: NASA/CR-1998-208099
Report Number: NAS 1.26:208099
Meeting Information
Meeting: Aerospace Environmental Technology Conference
Location: Huntsville, Al
Country: United States
Start Date: June 1, 1998
Funding Number(s)
CONTRACT_GRANT: NAS8-36200
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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