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Advances in Thin Film Thermocouple Durability Under High Temperature and Pressure Testing ConditionsThin film thermocouples for measuring material surface temperature have been previously demonstrated on several material systems and in various hostile test environments. A well-developed thin film fabrication procedure utilizing shadow masking for patterning the sensors elements had produced thin films with sufficient durability for applications in high temperature and pressure environments that exist in air-breathing and hydrogen-fueled burner rig and engine test facilities. However, while shadow masking had been a reliable method for specimens with flat and gently curved surfaces, it had not been consistently reliable for use on test components with sharp contours. This work reports on the feasibility of utilizing photolithography processing for patterning thin film thermocouples. Because this patterning process required changes in the thin film deposition process from that developed for shadow masking, the effect of these changes on thin film adherence during burner rig testing was evaluated. In addition to the results of changing the patterning method, the effects on thin film adherence of other processes used in the thin film fabrication procedure is also presented.
Document ID
19990019322
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Martin, Lisa C.
(NASA Lewis Research Center Cleveland,OH United States)
Fralick, Gustave C.
(NASA Lewis Research Center Cleveland,OH United States)
Taylor, Keith F.
(Cortez 3 Service Corp. Cleveland, OH United States)
Date Acquired
September 6, 2013
Publication Date
January 1, 1999
Subject Category
Instrumentation And Photography
Report/Patent Number
E-11407
NASA/TM-1999-208812
NAS 1.15:208812
Funding Number(s)
PROJECT: RTOP 537-04-22
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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