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Chemical-Vapor-Deposited Diamond FilmThis chapter describes the nature of clean and contaminated diamond surfaces, Chemical-vapor-deposited (CVD) diamond film deposition technology, analytical techniques and the results of research on CVD diamond films, and the general properties of CVD diamond films. Further, it describes the friction and wear properties of CVD diamond films in the atmosphere, in a controlled nitrogen environment, and in an ultra-high-vacuum environment.
Document ID
19990021240
Acquisition Source
Legacy CDMS
Document Type
Technical Memorandum (TM)
Authors
Miyoshi, Kazuhisa
(NASA Lewis Research Center Cleveland,OH United States)
Date Acquired
September 6, 2013
Publication Date
February 1, 1999
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA/TM-1999-107249/CH9
E-9863-9
NAS 1.15:107249/CH9
Report Number: NASA/TM-1999-107249/CH9
Report Number: E-9863-9
Report Number: NAS 1.15:107249/CH9
Funding Number(s)
PROJECT: RTOP 523-22-13
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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