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High-Temperature Slow Crack Growth of Silicon Carbide Determined by Constant-Stress-Rate and Constant-Stress TestingHigh-temperature slow-crack-growth behaviour of hot-pressed silicon carbide was determined using both constant-stress-rate ("dynamic fatigue") and constant-stress ("static fatigue") testing in flexure at 1300 C in air. Slow crack growth was found to be a governing mechanism associated with failure of the material. Four estimation methods such as the individual data, the Weibull median, the arithmetic mean and the median deviation methods were used to determine the slow crack growth parameters. The four estimation methods were in good agreement for the constant-stress-rate testing with a small variation in the slow-crack-growth parameter, n, ranging from 28 to 36. By contrast, the variation in n between the four estimation methods was significant in the constant-stress testing with a somewhat wide range of n= 16 to 32.
Document ID
19990079790
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
External Source(s)
Authors
Choi, Sung H.
(Cleveland State Univ. Cleveland, OH United States)
Salem, J. A.
(NASA Lewis Research Center Cleveland, OH United States)
Nemeth, N. N.
(NASA Lewis Research Center Cleveland, OH United States)
Date Acquired
September 6, 2013
Publication Date
January 1, 1998
Publication Information
Publication: Journal of Materials Science
Publisher: Chapman and Hall
Volume: 33
ISSN: 0022-2461
Subject Category
Structural Mechanics
Funding Number(s)
CONTRACT_GRANT: DE-AC05-84OR-21400
Distribution Limits
Public
Copyright
Public Use Permitted.
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