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Issues and Effects of Atomic Oxygen Interactions With Silicone Contamination on Spacecraft in Low Earth OrbitThe continued presence and use of silicones on spacecraft in low Earth orbit (LEO) has been found to cause the deposition of contaminant films on surfaces which are also exposed to atomic oxygen. The composition and optical properties of the resulting SiO(x)- based (where x is near 2) contaminant films may be dependent upon the relative rates of arrival of atomic oxygen, silicone contaminant and hydrocarbons. This paper presents results of in-space silicone contamination tests, ground laboratory simulation tests and analytical modeling to identify controlling processes that affect contaminant characteristics.
Document ID
20000064110
Acquisition Source
Glenn Research Center
Document Type
Preprint (Draft being sent to journal)
Authors
Banks, Bruce
(NASA Glenn Research Center Cleveland, OH United States)
Rutledge, Sharon
(NASA Glenn Research Center Cleveland, OH United States)
Sechkar, Edward
(DYNACS Engineering Co., Inc. Brook Park, OH United States)
Stueber, Thomas
(DYNACS Engineering Co., Inc. Brook Park, OH United States)
Snyder, Aaron
(NASA Glenn Research Center Cleveland, OH United States)
deGroh, Kim
(NASA Glenn Research Center Cleveland, OH United States)
Haytas, Christy
(Cleveland State Univ. Cleveland, OH United States)
Brinker, David
(NASA Glenn Research Center Cleveland, OH United States)
Date Acquired
September 7, 2013
Publication Date
May 1, 2000
Subject Category
Spacecraft Design, Testing And Performance
Report/Patent Number
E-12258
NAS 1.15:210056
NASA/TM-2000-210056
Meeting Information
Meeting: Materials in a Space Environment
Location: Arcachon
Country: France
Start Date: June 4, 2000
End Date: June 9, 2000
Sponsors: Canadian Space Agency, Centre National d'Etudes Spatiales, Integrity Testing Lab., European Space Agency, Office National d'Etudes et de Recherches Aerospatiales
Funding Number(s)
PROJECT: RTOP 632-6A-1E
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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