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High Temperature Oxidation of Boron NitrideHigh temperature oxidation of monolithic boron nitride (BN) is examined. Hot pressed BN and both low and high density CVD BN were studied. It is shown that oxidation rates are quite sensitive to microstructural factors such as orientation, porosity, and degree of crystallinity. In addition small amounts of water vapor lead to volatilization of the B2O3 oxide as H(x)B(y)O(z). For these reasons, very different oxidation kinetics were observed for each type of BN.
Document ID
20010064405
Acquisition Source
Legacy CDMS
Document Type
Preprint (Draft being sent to journal)
Authors
Jacobson, Nathan
(NASA Lewis Research Center Cleveland, OH United States)
Farmer, Serene
(NASA Lewis Research Center Cleveland, OH United States)
Moore, Arthur
(Advanced Ceramics Corp. Lakewood, OH United States)
Sayir, Haluk
(Advanced Ceramics Corp. Lakewood, OH United States)
Date Acquired
September 7, 2013
Publication Date
January 1, 1997
Subject Category
Nonmetallic Materials
Funding Number(s)
PROJECT: RTOP 523-21-13
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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