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Process-Induced Carbon and Sub-Layer in SiC/BN/SiC Composites: Characterization and ConsequencesFollowing our detection of films of elemental carbon in the Hi-Nicalon TM/BN/SiC composite and its deleterious effect on oxidative durability, we have examined other SiC/BN/SiC systems. The problem is pervasive, and significant residues of free carbon are confirmed in Sylramic /BN/SiC materials. Effective techniques for routine detection and characterization of adventitious carbon in SiC/BN/SiC composites are discussed.
Document ID
20010092700
Acquisition Source
Glenn Research Center
Document Type
Preprint (Draft being sent to journal)
Authors
Ogbuji, L. U. J. T (QSS Group, Inc. Brook Park, OH United States)
Wheeler, D. R. (NASA Glenn Research Center Cleveland, OH United States)
McCue, T. R. (QSS Group, Inc. Brook Park, OH United States)
Date Acquired
September 7, 2013
Publication Date
July 1, 2001
Subject Category
Composite Materials
Report/Patent Number
NAS 1.15:211069
E-12905
NASA/TM-2001-211069
Funding Number(s)
PROJECT: RTOP 714-04-30
CONTRACT_GRANT: NAS3-00145
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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