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Mirror TechnologyUnder a NASA contract, MI-CVD developed a process for producing bulk silicon carbide by means of a chemical vapor deposition process. The technology allows growth of a high purity material with superior mechanical/thermal properties and high polishability - ideal for mirror applications. The company employed the technology to develop three research mirrors for NASA Langley and is now marketing it as CVD SILICON CARBIDE. Its advantages include light weight, thermal stability and high reflectivity. The material has nuclear research facility applications and is of interest to industrial users of high power lasers.
Document ID
20020083265
Acquisition Source
Langley Research Center
Document Type
Other
Date Acquired
August 20, 2013
Publication Date
January 1, 1992
Publication Information
Publication: Spinoff 1992
ISBN: 0-16-038211-4
Subject Category
Optics
Report/Patent Number
ISBN: 0-16-038211-4
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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