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Piezoresistive Property of CVD Diamond FilmsPiezoresistive properties of chemical vapor-deposited boron-doped p-type polycrystalline diamond films were investigated. The p-type polycrystalline diamond films of about 2 μm thickness were grown on SiO2/Si substrate using a hot-filament reactor. Effective carbon concentration, defined as (C-O)/H, was varied from 2.2 to 5.5 %, and boron to carbon ratio was kept constant. Gauge factor for the p-type diamond piezoresister decreased with carbon to hydrogen ratio. The quality of the diamond films were examined by using a scanning electron microscope (SEM), Raman spectroscopy and X-ray diffraction. The diamond films were degraded with the (C-O)/H.
Document ID
20030068532
Acquisition Source
Glenn Research Center
Document Type
Conference Paper
Authors
Akira Yamamoto
(Hiroshima Prefectural Agriculture Research Center Hiroshima, Japan)
Takahiro Tsutsumoto
(Hiroshima Prefectural Agriculture Research Center Hiroshima, Japan)
Date Acquired
August 21, 2013
Publication Date
August 1, 2003
Publication Information
Publication: Proceedings of the Seventh Applied Diamond Conference/Third Frontier Carbon Technology Joint Conference
Publisher: National Aeronautics and Space Administration
Subject Category
Electronics and Electrical Engineering
Report/Patent Number
NASA/CP-2003-212319
Meeting Information
Meeting: 3rd Frontier Carbon Technology (FCT) Joint Conference
Location: Tsukuba
Country: JP
Start Date: August 18, 2003
End Date: August 21, 2003
Sponsors: Nippon Institute of Technology, National Institute of Advanced Industrial Science and Technology, Glenn Research Center
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Keywords
P-type diamond films
Hot filament CVD
Gauge factor
Piezoresistive effect
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