Synthesis of B-C-N Films by Electron Beam Excited Plasma-Assisted rf Magnetron Sputtering

Boron-carbon-nitrogen (B-C-N) thin films have been synthesized using electron beam excited plasma (EBEP)-assisted rf magnetron sputtering system with boron nitride and graphite target. Compositions of the films were varied by controlling the rf power for the graphite target and determined by X-ray photoelectron spectroscopy. We obtained B(x)C(y)N films, x=1.0 - 1.1 and y = 0.03 - 0.25. The composition dependence of infrared transmission spectra showed that structure of the film was very sensitive to carbon content; a cubic phase was found only in a carbon-poor region and disappeared abruptly with increasing carbon content. Results of transmission electron microscope, electron diffraction, and electron energy loss spectroscopy measurements show that the films involve the cubic phase of carbon-poor B-C-N compound.