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A Nanoindentation Study of Thick Cubic Boron Nitride Films Prepared by Chemical Vapor DepositionThe mechanical properties of high-quality cubic boron nitride (cBN) films deposited using fluorine chemistry were systematically investigated by nano-indentation measurements performed in both cross-sectional and plan-view directions. The large film thickness (~5 m) allows the effective suppression of both substrate and indenter size effects. The hardness and elastic modulus values were found to be 70 and 800 GPa, respectively, which are the highest values ever obtained on cBN films deposited by either PVD or CVD methods so far (comparable to those reported for cBN crystals synthesized by high-pressure high-temperature methods). The variation of hardness across the cBN film thickness was investigated using a cross sectional configuration. In conjunction with the transmission electron microscopic observations, the relationship of the hardness measured with the crystallinity and crystal size/grain boundaries was discussed.
Document ID
20030068561
Acquisition Source
Glenn Research Center
Document Type
Abstract
Authors
C Y Chan
(University of Hong Kong Hong Kong, Hong Kong)
W J Zhang
(University of Hong Kong Hong Kong, Hong Kong)
K M Chan
(University of Hong Kong Hong Kong, Hong Kong)
I Bello
(University of Hong Kong Hong Kong, Hong Kong)
S T Lee
(University of Hong Kong Hong Kong, Hong Kong)
S Matsumoto
(National Institute for Materials Science Tsukuba, Japan)
Date Acquired
August 21, 2013
Publication Date
August 1, 2003
Publication Information
Publication: Proceedings of the Seventh Applied Diamond Conference/Third Frontier Carbon Technology Joint Conference
Publisher: National Aeronautics and Space Administration
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA/CP-2003-212319
Meeting Information
Meeting: 3rd Frontier Carbon Technology (FCT) Joint Conference
Location: Tsukuba
Country: JP
Start Date: August 18, 2003
End Date: August 21, 2003
Sponsors: Nippon Institute of Technology, National Institute of Advanced Industrial Science and Technology, Glenn Research Center
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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