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A DC HF CVD Process to Grow Films of Aligned Carbon Nanotubes: Applications to Field EmissionA DC HF CVD process to grow films of aligned carbon nanotubes. Applications to field emission. We will describe a new DirectCurrent Hot Filament Catalytic CVD process (DC HF CCVD) that is quite convenient to grow films of aligned carbon nanotubes with a high selectivity. The process is designed in a ultra high vacuum chamber directly connected to a surface analysis chamber provided with XPS AES ELS probes for determination of the carbon nature and surface cleaning and deposition tools (ion beam thermal vacuum evaporation).
Document ID
20030068571
Acquisition Source
Glenn Research Center
Document Type
Abstract
Authors
Francois LeNormand
(Centre National de la Recherche Scientifique Strasbourg, France)
Cojocaru
(Centre National de la Recherche Scientifique Strasbourg, France)
Date Acquired
August 21, 2013
Publication Date
August 1, 2003
Publication Information
Publication: Proceedings of the Seventh Applied Diamond Conference/Third Frontier Carbon Technology Joint Conference
Publisher: National Aeronautics and Space Administration
Subject Category
Solid-State Physics
Report/Patent Number
NASA/CP-2003-212319
Meeting Information
Meeting: 3rd Frontier Carbon Technology (FCT) Joint Conference
Location: Tsukuba
Country: JP
Start Date: August 18, 2003
End Date: August 21, 2003
Sponsors: Nippon Institute of Technology, National Institute of Advanced Industrial Science and Technology, Glenn Research Center
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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