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Formation and Analysis of Dense Boron Carbide Coatings With a Low Porosity Formed by Electromagnetically Accelerated Plasma SprayingThick coatings, which are necessary for many industrial fields, are easily obtained using thermal spraying compared with other methods such as CVD and PVD. However, the porosity is relatively high in the spray coatings. The ambient gases passing through the many pores in the coating may damage a base substrate material, and the coating would be easily detached. We have obtained thick boron carbide (B4C) coating with a porosity of 3% using electromagnetically accelerated plasma spraying. In this study, by using smaller powder of 2 micron in diameter, dense B4C coatings are formed with a low porosity of less than 1%. The size of the pores is also drastically decreased.
Document ID
20030068627
Acquisition Source
Glenn Research Center
Document Type
Abstract
Authors
Junya Kitamura
(Japan Fine Ceramics Center Nagoya, Japan)
Shu Usuba
(National Institute of Advanced Industrial Science and Technology Tsukuba, Japan)
Yozo Kakudate
(National Institute of Advanced Industrial Science and Technology Tsukuba, Japan)
Hiroyuki Yokoi
(National Institute of Advanced Industrial Science and Technology Tsukuba, Japan)
Kazuhiro Yamamoto
(National Institute of Advanced Industrial Science and Technology Tsukuba, Japan)
Akihiro Tanaka
(National Institute of Advanced Industrial Science and Technology Tsukuba, Japan)
Shuzo Fujiwara
(National Institute of Advanced Industrial Science and Technology Tsukuba, Japan)
Date Acquired
August 21, 2013
Publication Date
August 1, 2003
Publication Information
Publication: Proceedings of the Seventh Applied Diamond Conference/Third Frontier Carbon Technology Joint Conference
Publisher: National Aeronautics and Space Administration
Subject Category
Nonmetallic Materials
Report/Patent Number
NASA/CP-2003-212319
Meeting Information
Meeting: 7th Applied Diamond Conference (ADC)
Location: Tsukuba
Country: JP
Start Date: August 18, 2003
End Date: August 21, 2003
Sponsors: Nippon Institute of Technology, National Institute of Advanced Industrial Science and Technology, Glenn Research Center
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.

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