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Balanced Flow Metering and Conditioning: Technology for Fluid SystemsRevolutionary new technology that creates balanced conditions across the face of a multi-hole orifice plate has been developed, patented and exclusively licensed for commercialization. This balanced flow technology simultaneously measures mass flow rate, volumetric flow rate, and fluid density with little or no straight pipe run requirements. Initially, the balanced plate was a drop in replacement for a traditional orifice plate, but testing revealed substantially better performance as compared to the orifice plate such as, 10 times better accuracy, 2 times faster (shorter distance) pressure recovery, 15 times less acoustic noise energy generation, and 2.5 times less permanent pressure loss. During 2004 testing at MSFC, testing revealed several configurations of the balanced flow meter that match the accuracy of Venturi meters while having only slightly more permanent pressure loss. However, the balanced meter only requires a 0.25 inch plate and has no upstream or downstream straight pipe requirements. As a fluid conditioning device, the fluid usually reaches fully developed flow within 1 pipe diameter of the balanced conditioning plate. This paper will describe the basic balanced flow metering technology, provide performance details generated by testing to date and provide implementation details along with calculations required for differing degrees of flow metering accuracy.
Document ID
20060007813
Acquisition Source
Marshall Space Flight Center
Document Type
Conference Paper
Authors
Kelley, Anthony R.
(NASA Marshall Space Flight Center Huntsville, AL, United States)
Date Acquired
September 7, 2013
Publication Date
January 1, 2006
Subject Category
Fluid Mechanics And Thermodynamics
Meeting Information
Meeting: Instrumentation Symposium for the Process Industries
Location: College Station, TX
Country: United States
Start Date: January 24, 2006
End Date: January 26, 2006
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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