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Taguchi Optimization for the Processing of Epon SU-8 Resist
Document ID
20060035690
Acquisition Source
Jet Propulsion Laboratory
Document Type
Preprint (Draft being sent to journal)
External Source(s)
hdl:2014/22802
Authors
Eyre, B.
Blosiu, J.
Wiberg, D.
Date Acquired
August 23, 2013
Publication Date
January 25, 1998
Distribution Limits
Public
Copyright
Other
Keywords
adherence to substrate
orthogonal arrays photoresist reveal output sensitivity space resolutinon

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