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Proximity Effect Corrected Phase Holograms in PMMAComputer generated phase holograms have been fabricated by E-Beam lithography in PMMA using patterned exposure and subsequent partial development.
Document ID
20060038623
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
External Source(s)
hdl:2014/34811
Authors
Maker, P.
Muller, R.
Date Acquired
August 23, 2013
Publication Date
June 1, 1993
Distribution Limits
Public
Copyright
Other
Keywords
phase holograms E-Beam PMMA dose deposition function atomic force microscopy

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