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Stitching Error Reduction in Electron Beam Written GratingsA multiple-write electron beam lithography techniques is described as linear filter on the grating spatial frequency spectrum.
Document ID
20060041040
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
External Source(s)
hdl:2014/18847
Authors
Dougherty, D.
Muller, R.
Maker, P.
Mansour, K.
Chacon, R.
Qiu, Y.
Young, M.
Forouhar, S.
Date Acquired
August 23, 2013
Publication Date
May 1, 2000
Subject Category
Lasers And Masers
Distribution Limits
Public
Copyright
Other
Keywords
electron beam lithography gratings stitching error semiconductor lasers

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