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Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum LimitOptical masking lithography has been the primary tool of the semiconductor industry for transferring circuit images onto substrates to form semiconductor chips.
Document ID
20060041053
Acquisition Source
Jet Propulsion Laboratory
Document Type
Reprint (Version printed in journal)
External Source(s)
hdl:2014/18881
Authors
Dowling, J.
Boto, A.
Abrams, D.
Williams, C.
Date Acquired
August 23, 2013
Publication Date
January 1, 1999
Publication Information
Publication: Physical Review Letters
Distribution Limits
Public
Copyright
Other
Keywords
interferometric optical lithography quantum parametric

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