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Two-photon interferometry for high-resolution imagingWe discuss advantages of using non-classical states of light for two aspects of optical imaging: creating of miniature images on photosensitive substrates, which constitutes the foundation for optical lithography, and conversely, imaging of micro objects. In both cases, the classical resolution limit given by the Rayleigh criterion is approximately a half of the optical wavelength. It has been shown, however, that by using multi-photon quantum states of the light field, and multi-photon sensitive material or detector, this limit can be surpassed. In the present work, we give a rigorous quantum mechanical treatment of this problem, address some particularly widespread misconceptions and discuss the requirements arising on the way of turning the research on quantum imaging into a practical technology.
Document ID
20060044264
Acquisition Source
Jet Propulsion Laboratory
Document Type
Conference Paper
External Source(s)
Authors
Strekalov, Dmitry
Dowling, Jonathan
Date Acquired
August 23, 2013
Publication Date
January 7, 2001
Meeting Information
Meeting: Physics of Quantum Electronics
Location: Snowbird, UT
Country: United States
Start Date: January 7, 2001
End Date: January 11, 2001
Distribution Limits
Public
Copyright
Other
Keywords
quantum technology
nanolithography

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