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Over-under double-pass interferometerAn over-under double-pass interferometer in which the beamsplitter area and thickness can be reduced to conform only with optical flatness considerations is achieved by offsetting the optical center line of one cat's-eye retroreflector relative to the optical center line of the other in order that one split beam be folded into a plane distinct from the other folded split beam. The beamsplitter is made transparent in one area for a first folded beam to be passed to a mirror for doubling back and is made totally reflective in another area for the second folded beam to be reflected to a mirror for doubling back. The two beams thus doubled back are combined in the central, beam-splitting area of the beamsplitter and passed to a detector. This makes the beamsplitter insensitive to minimum-thickness requirements and selection of material.
Document ID
20080004201
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Schindler, Rudolf A.
Date Acquired
August 24, 2013
Publication Date
January 1, 1980
Subject Category
Optics
Report/Patent Number
Patent Number: US-PATENT-4,181,440
Patent Application Number: US-PATENT-APPL-SN-858596
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-4,181,440
Patent Application
US-PATENT-APPL-SN-858596
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