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Process for producing a high emittance coating and resulting articleProcess for anodizing aluminum or its alloys to obtain a surface particularly having high infrared emittance by anodizing an aluminum or aluminum alloy substrate surface in an aqueous sulfuric acid solution at elevated temperature and by a step-wise current density procedure, followed by sealing the resulting anodized surface. In a preferred embodiment the aluminum or aluminum alloy substrate is first alkaline cleaned and then chemically brightened in an acid bath The resulting cleaned substrate is anodized in a 15% by weight sulfuric acid bath maintained at a temperature of 30.degree. C. Anodizing is carried out by a step-wise current density procedure at 19 amperes per square ft. (ASF) for 20 minutes, 15 ASF for 20 minutes and 10 ASF for 20 minutes. After anodizing the sample is sealed by immersion in water at 200.degree. F. and then air dried. The resulting coating has a high infrared emissivity of about 0.92 and a solar absorptivity of about 0.2, for a 5657 aluminum alloy, and a relatively thick anodic coating of about 1 mil.
Document ID
20080004275
Acquisition Source
Johnson Space Center
Document Type
Other - Patent
Authors
Le, Huong G.
O'Brien, Dudley L.
Date Acquired
August 24, 2013
Publication Date
June 8, 1993
Subject Category
Metals And Metallic Materials
Report/Patent Number
Patent Number: US-PATENT-5,217,600
Patent Application Number: US-PATENT-APPL-SN-876768
Funding Number(s)
CONTRACT_GRANT: NAS9-18200
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-5,217,600
Patent Application
US-PATENT-APPL-SN-876768
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