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Diffractive optical elements on non-flat substrates using electron beam lithographyThe present disclosure describes a technique for creating diffraction gratings on curved surfaces with electron beam lithography. The curved surface can act as an optical element to produce flat and aberration-free images in imaging spectrometers. In addition, the fabrication technique can modify the power structure of the grating orders so that there is more energy in the first order than for a typical grating. The inventors noticed that by using electron-beam lithography techniques, a variety of convex gratings that are well-suited to the requirements of imaging spectrometers can be manufactured.
Document ID
20080004513
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Maker, Paul D.
Muller, Richard E.
Wilson, Daniel W.
Date Acquired
August 24, 2013
Publication Date
November 12, 2002
Subject Category
Optics
Report/Patent Number
Patent Number: US-PATENT-6,480,333
Patent Application Number: US-PATENT-APPL-SN-196612
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,480,333
Patent Application
US-PATENT-APPL-SN-196612
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