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Silicon based substrate with yttrium silicate environmental/thermal barrier layerA barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a yttrium silicate.
Document ID
20080004640
Acquisition Source
Glenn Research Center
Document Type
Other - Patent
Authors
Eaton, Jr., Harry Edwin
Allen, William Patrick
Jacobson, Nathan S.
Lee, Kang N.
Opila, Elizabeth J.
Smialek, James L.
Wang, Hongyu
Meschter, Peter Joel
Luthra, Krishan Lal
Date Acquired
August 24, 2013
Publication Date
November 6, 2001
Subject Category
Chemistry And Materials (General)
Funding Number(s)
CONTRACT_GRANT: NAS3-26385
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,312,763
Patent Application
US-PATENT-APPL-SN-714396

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