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Lithography using quantum entangled particlesA system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
Document ID
20080004892
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Williams, Colin
Dowling, Jonathan
Date Acquired
August 24, 2013
Publication Date
June 26, 2001
Subject Category
Optics
Report/Patent Number
Patent Application Number: US-PATENT-APPL-SN-393451
Patent Number: US-PATENT-6,252,665
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,252,665
Patent Application
US-PATENT-APPL-SN-393451

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