NASA Logo

NTRS

NTRS - NASA Technical Reports Server

Collections About News Help Login

Press Enter or click the Search button to begin your search.

Back to Results
Lithography system using quantum entangled photonsA system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
Document ID
20080004949
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Williams, Colin
Dowling, Jonathan
della Rossa, Giovanni
Date Acquired
August 24, 2013
Publication Date
November 12, 2002
Subject Category
Optics
Report/Patent Number
Patent Application Number: US-PATENT-APPL-SN-393200
Patent Number: US-PATENT-6,480,283
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,480,283
Patent Application
US-PATENT-APPL-SN-393200

Related Records

There are no records associated with this record.
No Preview Available