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Silicon based substrate with environmental/ thermal barrier layerA barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.
Document ID
20080004987
Acquisition Source
Glenn Research Center
Document Type
Other - Patent
Authors
Eaton, Jr., Harry Edwin
Allen, William Patrick
Jacobson, Nathan S.
Bansal, Nanottam P.
Opila, Elizabeth J.
Smialek, James L.
Lee, Kang N.
Spitsberg, Irene T.
Wang, Hongyu
Meschter, Peter Joel
Date Acquired
August 24, 2013
Publication Date
June 25, 2002
Subject Category
Solid-State Physics
Funding Number(s)
CONTRACT_GRANT: NAS3-26385
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,410,148
Patent Application
US-PATENT-APPL-SN-292349

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