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Lithography using quantum entangled particlesA system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.
Document ID
20080005094
Acquisition Source
Headquarters
Document Type
Other - Patent
Authors
Williams, Colin
Dowling, Jonathan
della Rossa, Giovanni
Date Acquired
August 24, 2013
Publication Date
October 7, 2003
Subject Category
Instrumentation And Photography
Report/Patent Number
Patent Number: US-PATENT-6,630,290
Patent Application Number: US-PATENT-APPL-SN-819364
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
US-PATENT-6,630,290
Patent Application
US-PATENT-APPL-SN-819364

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